The Multiband Plasma Monitor (MPM) series C10346 is a device for the real-time monitoring of plasma processes in the semiconductor industry by Optical Emission Spectroscopy (OES). Unlike with other methods, more than a thousand spectral channels can be observed simultaneously, contributing to superb sensitivity and selectivity of the measurement. Powerful hardware, sophisticated data analysis and user-friendly software, we offer a complete suite of application-oriented problem solutions covering many applications such as such as etching, sputtering, cleaning and CVD.

Our solutions can be easily embedded into existing customer production and IT environments.

• Simultaneous recording of 1024 optical channels
• Spectral range from 200 to 950 nm
• Up to 50 complete spectra per second
• Robust design, maintenance-free
• Powerful data processing / compression and signal extraction
• Additional analog and digital interface ports
• Complete software solutions for endpoint control, FDC, APC, factory integration
• System can be remotely monitored or controlled via TCP/IP, factory-wide or even over the Internet

• Characterization, diagnostics and optimization of plasma processes
• Highly sensitive etch endpoint control
• Highly selective Automatic Fault Detection and Control (FDC)
• Advanced Process Control (APC)
• Tool comparison and matching
• Optimization of chamber cleaning schedules

 Datasheet